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Polysilicon

LS-36 Dry-base

Disproportionation for Polysilicon Purification.

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LS-36 Dry-base 

Disproportionation resin 


Description

LS-36 Dry-base resin is a kind of high efficiency & cost-effective weak base resin catalyst, this weak base anion exchange resin is specifically used for the purification & disproportionation of chlorosilanes. It also can be used to remove impurities of boron & phosphorus in chlorosilane, so as to improve the products' purity.


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Hygroscopicity

LS-36 Dry-base resin will appear its characteristics of absorbing moisture from the air, and the moisture content will be affected by the ambient humidity. Due to the effect of Dry-base resin on water absorption when exposed to air, it is recommended to avoid exposure of LS-36 Dry-base resin to air containing moisture.


Recommended Conditions for loading

1) Weather: in a sunny day, and with dry air condition; 

2) Nitrogen: Dew point of Nitrogen should be lower than -60, with purity above 99.9%; 

3) Equipment: Should be dry & clean without other residuals; Ensure that the flanges, pressure gauge, thermometer etc be tightly connected without leakage point; Weld seam of the equipment and chlorosilane should be inspected carefully, and the exhaust gas system pressure of the adsorption column should be 0. 

The specific loading needs to be determined according to the working conditions of the site.


Operation & Maintenance

For daily use, it is necessary to observe the change of pressure and inlet & outlet temperature on time. When the temperature difference or pressure difference is too big, the silane purity data should be controlled in time, and check whether there were blockage. 


If the shutdown time is long, it must be replaced with 99% silicon tetrachloride from the bottom to the top, and replace & detect after the outlet content be qualified, then push out chlorosilane with high purity nitrogen (chlorosilane can be drained by gravity, and then be pushed out by nitrogen, to minimize the impact of nitrogen swelling on the quality of use high-purity hydrogen to ejector according to the system), and be stored with pressure, check the pressure in the column during this period to prevent valve leakage. 

When second-use, it should be activated by swelling operation.


Precautions

Do not mix resin with strong oxidants, as it may cause explosive reaction.

For more detailed technical information, please contact LANSHEN directly.






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